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美國JC Nabity Lithography Systems 
美國JC Nabity Lithography Systems成立于1988年.公司成功研發了基于改造商品SEM、STEM或FIB的電子束曝光裝置（Nanometer Pattern Generation System納米圖形發生系統，簡稱NPGS，又稱電子束微影系統）。電子束曝光技術具有可直接刻畫精細圖案的優點，且高能電子的波長短（< 1 nm），可避免繞射效應的困擾，是實驗室制作微小納米電子元件最佳的選擇。相對于購買昂貴的專用電子束曝光機臺，以既有的SEM等為基礎，外加電子束控制系統，透過電腦介面控制電子顯微鏡中電子束之矢量掃描，以進行直接刻畫圖案，在造價方面可大幅節省，且兼具原SEM 的觀測功能，在功能與價格方面均具有優勢。由于其具有高分辨率以及低成本等特點，在北美研究機構中，JC Nabity的NPGS是最熱銷的配套于掃描電鏡的電子束微影曝光系統，而且它的應用在世界各地越來越廣泛。
    NPGS的技術目標是提供一個功能強大的多樣化簡易操作系統，結合使用市面上已有的掃描電鏡、掃描透射電鏡或聚焦離子束裝置，用來實現藝術級的電子束或離子束平版印刷技術。NPGS能成功滿足這個目的，得到了當前眾多用戶的強烈推薦和一致肯定。
JC Nabity Lithography Systems is the company I started as a graduate student in 1988 after it became apparent that the Nanometer Pattern Generation System (NPGS) was significantly better than any commercial SEM based lithography system available at the time. Through word of mouth recommendations alone, sales increased as I finished my Ph.D. in Physics, and at the end of 1991, I began working full time towards the sales and further refinement of NPGS. The timing was actually quite good, because while the competition had virtually a worldwide monopoly in SEM lithography, their lack of innovation, poor performance history, and incredibly high prices left many researchers wanting a high performance, low-cost system, which is exactly what NPGS provided. Since then, word of mouth recommendations have allowed NPGS to dominate the SEM lithography market in the US, so that now researchers in almost every major research university and many government labs in the US are using NPGS. Meanwhile, the competition has significantly improved their systems (when compared to their monopoly days) and they have significantly lowered their prices (at least on their "entry-level" system), however, NPGS continues to thrive based on the unmatched performance to price ratio that it offers.