MBE-35分子束外延系統(tǒng) MBE
價(jià) 格：詢價(jià)
產(chǎn) 地：美國(guó)更新時(shí)間：2020-10-29 14:12
品 牌：SVT Associates型 號(hào)：MBE-35
狀 態(tài)：正常點(diǎn)擊量：1652
400-006-7520
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聯(lián) 系 人：
上海非利加實(shí)業(yè)有限公司
電 話：
400-006-7520
傳 真：
400-006-7520
配送方式：
上海自提或三方快遞
聯(lián)系我時(shí)請(qǐng)說在上海非利加實(shí)業(yè)有限公司上看到的,謝謝！
Molecular Beam Epitaxy (MBE) is a key technology in enabling research and manufacturing of technology for semiconductor materials and devices. Due to ever increasing demand of communication bandwidth and chip density, device fabrication relies on the exact dimensional and quality controls that MBE provides. SVTA MBE systems offer an ultra-pure environment for precision fabrication of a wide variety of thin film structures for microelectronic, opto-electronic, and magnetic applications. SVTA MBE Systems are specially designed for the materials they produce. The MBE Systems are equipped with hardware and software capabilities to monitor, display, and control critical growth parameters.
產(chǎn)品參數(shù)
SVTA Systems are designed around a modular configuration consisting of several functional units. The modular system concept is a flexible and reliable way of adapting to different customer needs. Typically, there are at least two separate modules, one for the deposition process and one for wafer loading/sample preparation. There are other processing modules, such as cluster tool, wafer cleaving tool and material analysis modules that may be added depending on the customer needs. Each module has its own independent UHV pumping system and can be isolated from other modules by gate valves. This arrangement makes it possible to perform various system functions independently and concurrently: substrate loading, sample treatment, film growth, and sample analysis.
產(chǎn)品介紹
The SVTA-MBE35 system has been specifically designed to grow high quality III-V or II-VI compound semiconductor materials. The modular system concept is a flexible and reliable way of adapting to different customer needs. The base system consists of two modules: Epitaxy Growth Module and Load Lock/Buffer/Preparation Module. Each module has its own independent UHV pumping system and can be isolated from each other by a gate valve. The system can be configured combining the use of solid and gas sources for deposition. The flexibility of the system configuration ensures that the system can be used for a wide variety of application and development purposes. It comes standard in either a linear or right angle configuration.
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